摘要: We use the idea of repeat measurement to determine the mean value and error
of light curve solution parameters of contact binaries. Our simulation is
realized by the Monte Carlo algorithm and Wilson-Devinney code. This method can
obtain the systematic and random error simultaneously. Within our 48 models,
the systematic errors are smaller than the random errors in most case.
According to the numerical calculations, it is found that the relative errors
of photometric mass ratios are less than 1% for totally eclipsing contact
binaries, while they are generally between 10% and 20% for partly eclipsing
ones. The effect of third light on the errors of photometric solution is also
investigated. With a third light, these errors are close to 10% for totally
eclipsing contact binaries. Specially, it is better to set the third light to
zero in flux if that light is very faint (e.g., less than 1% contribution in
luminosity), because such faint third light will bring big errors to the light
curve solutions.