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Directional growth of nanocrystalline Si nanorod array by mid-frequency magnetron sputtering 后印本

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摘要: A new route to fast prepare well-aligned nanocrystalline Si nanorod array by mid-frequency [MF] magnetron sputtering was proposed in this study. Pulsed bias technique has been employed to adjust ion-bombardment condition over the growing film surface. For

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[V1] 2017-05-02 12:34:41 ChinaXiv:201705.00497V1 下载全文
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